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Centre de Nanosciences et de Nanotechnologies (C2N)

Research unit


The Center for Nanosciences and Nanotechnologies (C2N) is a joint research unit created in 2016 from the regrouping of two leading Ile-de-France laboratories in their field: the Laboratory of Photonics and Nanostructures (LPN) and the Institute of Fundamental Electronics (IEF) ). In 2018, the teams moved into a new building in the heart of the Paris-Saclay Campus.

C2N is developing research in the fields of materials, nanophotonics, nanoelectronics, nano-bio-technologies and microsystems, as well as those of nanotechnologies. On these subjects, it deals with fundamental and applied aspects.

The C2N hosts a clean room of 2900 m2, dedicated to micro-nanofabrication processes, growth, epitaxy and characterization of materials. Spaces are also dedicated to university and permanent training in micro-nanotechnologies, and 250m2 are reserved for start-up or SME activities. This Technology Center, open to all academic and industrial players in the field, is part of the national network of micro and nanotechnology plants (Renatech).


  • Mr Giancarlo FAINI

Innovation themes

Map and access

Rue André Ampère
Bâtiment 220
91405 ORSAY

Our research areas


- sample fabrication via epitaxy (heterostructures and III-V)
- photonics
- microfluidics
- quantum boxes
- photonic crystals
- nanowires
- optomechanics
- synthesis and study of graphene
- microscopy
- spectroscopy
- characterization
- nanoelectronics
- microsystems and nanobitechnology
- autonomous systems
- optoelectronics
- Monte-Carlo simulation
- electronic transport
- THz sources
- plasmonics
- spintronics
- thin film deposition
- CMOS technology
- bio-compatible micro-antennas
- nanofabrication
- solar arrays

Applications sectors

  • Networks / Telecom
  • Biotechnology
  • Aeronautics / Aerospace
  • Electronic / photonics
  • Materials (Metal, Glass, Ceramic, Composite...)

Total number of employees

Total number of employees : 410
Number of researchers : 120
Number of doctoral students : 100

Equipment(s) open to collaboration

Academics and industry:
Orsay site:
- deposition in vacuum, oxydation and annealing, photolithography, dry etching, electronic microscopy and lithography, physical and optical characterization, electrical characterization in low frequency range
- 6 automatic network analysers, 2 spectrum analysers, 2 microwave calibrated noise diodes ENR 5dB (18 GHz) and 15dB (26,5GHz), automatic polarisation (2 parametric sources HP4142)
- optical microscopy in visible range, NIR, DUV, IR microthermography with InSb camera, interferomatrical optical profilometers
- LASER Doppler vibrometer, Tmap system (Fogale Nanotech) used for wafer dimensionnal control, microindentation, cryo station for 3 points piezoelectrical measurements
- T resistivity, FFT IR spectrometry (FTIR, Varian) with PIKE mapping system for the characterization of surfaces, dielectric films etc.
- milling tools, piercing line, micro-plasma assembly, TIG soldering
- modeling : NEGF-TB, DFT, Ab-initio, Schrödinger-Poisson solver, MONACO (electronic transport via Monte-Carlo), 62 processors / 180 cores cluster

Marcoussis site: http://www.lpn.cnrs.fr/fr/TECHNO/CentraleTechno.php
Technological platform:
- metal and dielectric deposition, UV and electronic lithography, dry and wet etching, characterization (profilometry, EBM), thermal treatment
- alternative lithography (nano-printing, guided auto-assembly), Focused Ion Beam etching
- epitaxy means (several materials, high mobility / EBM and MOCVD)
- high resolution RX diffraction and TEM
- luminescence spectroscopy
Descartes platform: functional characterization of optical telecommunication devices (short pulses, LASER pulses, low-cost 40G emittor ...)


Our results

Valuation offer

Software :
MONACO : Monte-Carlo simulation of electronic transport

Patents :
-39 patents (Orsay site), 26 patents (Marcoussis site)
- Vertical External Cavity Surface Emitting Laser devices allowing high coherence high power and large tunability, EP14305752, (2014-05-21)
- substrat comprenant une couche de silicium et/ou de germanium et un ou plusieurs nanofils d'orientation perpendiculaire à la surface du substrat (N° 1256374). (2012-07-03)
- sources et capteurs de lumière comprenant au moins une microcavité à mode Tamm plasmonique localisé (International Application N°: PCT/FR1003/881) FR 1003/881 , (2010-09-30)
- heterostructures semiconductrices monolithiques epitaxiees et leur procede de fabrication (International Application N°: PCT/FR2008/051669), FR 2008/051669, (2008-09-17)

Patents of each team :

Projects examples

Optoelectronics and Photonics Chair with PSA Peugeot Citroën http://www.chaire-psa.u-psud.fr/

~80 outside projects/year via technological platform
List of CTU's projetcs http://www.ief.u-psud.fr/ief/ief.nsf/CTU/CTU_projetsListe.html
Polymers technologies http://www.ief.u-psud.fr/ief/ief.nsf/CTU/CTU_projet18.html

- other projects :

Industrial and scientific relations

Scientific collaborations

- France : Institut des Nanosciences de Paris, Institut Néel, Institut des Nanotechnologies de Lyon, Foton-OHM, Institut Physique de Rennes, ...
- International : Ecole Polytechnique Fédérale de Lausanne (Switzerland) Université de Zhejiang (China), Frontier Research Systems (Japan), National Institute of Advanced Industrial Science and Technology (Japan), Instituto de Microelectrónica de Madrid (Spain), Université de Barcelone (Spain), University of Cambridge (UK), Polytecnico di Milano (Italy), Naval Research Laboratory (USA) ...

Private collaborations

- collaboration with several companies (major companies, SME, start-up)


Establishments of affiliation